Plasma modeling
Showing all 5 results
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Role of magnetic field and bias configuration on HiPIMS deposition of W films
Vavassori D.; Mirani F.; Gatti F.; Dellasega D.; Passoni M. -
The 2022 Plasma Roadmap: low temperature plasma science and technology
Adamovich I.; Agarwal S.; Ahedo E.; Alves L.L.; Baalrud S.; Babaeva N.; Bogaerts A.; Bourdon A.; Bruggeman P.J.; Canal C.; Choi E.H.; Coulombe S.; Donko Z.; Graves D.B.; Hamaguchi S.; Hegemann D.; Hori M.; Kim H.-H.; Kroesen G.M.W.; Kushner M.J.; [ Et al. ] -
Implementation of multi-component Zhdanov closure in SOLEDGE3X
Bufferand H.; Balbin J.; Baschetti S.; Bucalossi J.; Ciraolo G.; Ghendrih P.; Mao R.; Rivals N.; Tamain P.; Yang H.; Giorgiani G.; Schwander F.; Scotto D’Abusco M.; Serre E.; Denis J.; Marandet Y.; Raghunathan M.; Innocente P.; Galassi D. -
Thermodynamic properties of air plasma seeded by SiC molecules
Colonna, Gianpiero -
Time dependent selfconsistent electron energy distribution functions during nanosecond repetitive discharges in reacting N-2/H-2 mixtures
Colonna, G.; Laricchiuta, A.; Pietanza, L. D.