In a world increasingly facing new challenges at the forefront of plasma scientific research and technological innovation, CNR and ISTP pledge progress and achieve an impact in the integration of research into societal practices and policy


The laboratories of the Low-Temperature Plasma Group in Bari are hosted by Università di Bari. Researchers in this field collaborate with other Institutes and University in a wide network as well as with industrial parties.

A large set of measurements of plasma chemical and physical characteristics are implemented by a variety of diagnostic techniques, ranging from electrical diagnostics, like the Langmuir probes, to optical and infrared emission analysis, to laser techniques like Thomson Scattering, Coherent Raman Scattering, Laser Induced Fluorescence (LIF), Cavity-Enhanced Absorption, Laser Induced Breakdown Spectroscopy (LIBS).

Microwave Plasma Enhanced Chemical Vapor Deposition (MWPECVD) is a versatile technique in the production of smart materials for high-tech industries like microelectronics, optoelectronics, photo-voltaics, biomaterials, food packaging, automobile, sensors.

Specifically, undoped nanocrystalline (NCD) and polycrystalline diamond (PCD) films are deposited by MWPECVD, starting from gas mixtures of CH4 highly diluted (less than 5%) in Ar and H2, respectively.

Dielectric Barrier Discharger Laboratory

Dielectric Barrier Discharger Systems for Agrifood application. The main activities are related to seeds decontamination and pre-treatment, Post-Harvest treatment for shelf-life improvements, and plasma activated medium (in particular plasma activated water) for decontamination and irrigation systems.

A HPC Cluster is available at our lab to support Plasma Simulation and Modelling. The system has 11 multiprocessor/multicore servers and is installed at our premises.