Plasma modeling
Showing all 5 results
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		Surface & coatings technology 458 pp. 129343-1 - 129343-17 Year: 2023 DOI: 10.1016/j.surfcoat.2023.129343
Role of magnetic field and bias configuration on HiPIMS deposition of W films
Vavassori D.; Mirani F.; Gatti F.; Dellasega D.; Passoni M. - 
		Journal of physics. D, Applied physics (Print) 55 (37), pp. 373001-1 - 373001-55 Year: 2022 DOI: 10.1088/1361-6463/ac5e1c
The 2022 Plasma Roadmap: low temperature plasma science and technology
Adamovich I.; Agarwal S.; Ahedo E.; Alves L.L.; Baalrud S.; Babaeva N.; Bogaerts A.; Bourdon A.; Bruggeman P.J.; Canal C.; Choi E.H.; Coulombe S.; Donko Z.; Graves D.B.; Hamaguchi S.; Hegemann D.; Hori M.; Kim H.-H.; Kroesen G.M.W.; Kushner M.J.; [ Et al. ] - 
		Plasma physics and controlled fusion (Online) 64 (5), pp. 055001-1 - 055001-18 Year: 2022 DOI: 10.1088/1361-6587/ac4fac
Implementation of multi-component Zhdanov closure in SOLEDGE3X
Bufferand H.; Balbin J.; Baschetti S.; Bucalossi J.; Ciraolo G.; Ghendrih P.; Mao R.; Rivals N.; Tamain P.; Yang H.; Giorgiani G.; Schwander F.; Scotto D’Abusco M.; Serre E.; Denis J.; Marandet Y.; Raghunathan M.; Innocente P.; Galassi D. - 
		Rendiconti lincei. Scienze fisiche e naturali 30 (3), pp. 537 - 547 Year: 2019 DOI: 10.1007/s12210-019-00811-x
Thermodynamic properties of air plasma seeded by SiC molecules
Colonna, Gianpiero - 
		Plasma physics and controlled fusion (Print) 62 (1), pp. 014003-1 - 014003-9 Year: 2020 DOI: 10.1088/1361-6587/ab469e
Time dependent selfconsistent electron energy distribution functions during nanosecond repetitive discharges in reacting N-2/H-2 mixtures
Colonna, G.; Laricchiuta, A.; Pietanza, L. D. 
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