plasma characterisationl
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Plasma sources science & technology (Online) 30 (4), pp. 045008-1 - 045008-10 Year: 2021 DOI: 10.1088/1361-6595/abef1b
Obtaining the unperturbed plasma potential in low-density, low-temperature plasmas
Causa F.; Gervasini G.; Uccello A.; Granucci G.; Ricci D.; Rispoli N.
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