In a world increasingly facing new challenges at the forefront of plasma scientific research and technological innovation, CNR and ISTP pledge progress and achieve an impact in the integration of research into societal practices and policy
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ACS omega pp. A-1 - M-13 Year: 2022 DOI: 10.1021/acsomega.2c02740
Unraveling the mechanism of maskless nanopatterning of black-silicon by CF4/H2 plasma reactive ion etching
Ghezzi Francesco; Pedroni Matteo; Kovac Janez; Causa Federica; Cremona Anna; Anderle Mariano; Caniello Roberto; Pietralunga Silvia M.; Vassallo Espedito
